Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf
1 PublicationOptical Stimulated Electron Emission from Amorphous Silicon Dioxide Implanted with Iron Ions
Kortov, V. S.; Zatsepin, A. F.; Biryukov, D. Y.; Schmidt, B.
Abstract
The photoelectron emission from SiO2 glasses and films after implantation of Fe+ ions was studied. Emissionactive oxygenvacancy defects like E'centers were detected. A longrange effect, which consisted in formation of point defects on the back side of the samples, was revealed when the samples were exposed to pulsed ion irradiation. Effects of radiation charging of surface layers of the test materials were analyzed.
Keywords: ion implantation; glass; E'-centers; photoelectron emission
- Poverchnost 7(2006)7, 84-87
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