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The Kinetics of the Ion-Beam-Induced Interfacial Amorphization in Silicon, Seite 5360, Manuskript-Nr.: 015721 JAP

Henkel, T.; Heera, V.; Kögler, R.; Skorupa, W.; Seibt, M.

• Journal of Applied Physics, 82 (11), 1 December 1997, S. 5360-5373

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