Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation

Ueda, Mario; Berni, L. A.; Gomes, G. F.; Beloto, A. F.; Abramof, E.; Reuther, Helfried

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Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation

Ueda, M.; Berni, L. A.; Gomes, G. F.; Beloto, A. F.; Abramof, E.; Reuther, H.

Abstract

A DC glow discharge source with controlled plasma potential was developed for application in plasma immersion ion implantation processing of materials.

Keywords: Ion implantation; Auger electron spectroscopy

Journal of Applied Physics 86 (1999) 4821 - 4824

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