Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

The application of Focused Ion Beams (FIB) has become a well-established and promising technique for patterning and prototyping on the nm-scale in research and development. Light ions in the range of m = 1 … 28 u (hydrogen to silicon) are of increasing interest due to the available high beam resolution in the nm range and their special chemical and physical behavior in the substrate. In this work helium and neon ion beams from a Helium Ion Microscope (HIM) are compared with ion beams like beryllium, lithium, boron, carbon and silicon obtained from a mass separated FIB using Liquid Metal Alloy Ion Sources (LMAIS) with respect to their imaging and milling resolution.