Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

1 Publication

Time of flight corrected beam blanker for ion beam lithography systems

Teichert, J.; Janssen, D.

Abstract

For an electrostatic beam blanker the deflection fields are calculated which prevent spurious deflections due to the ion time of flight. The beam blanker consists of two defection electrode pairs arranged symmetrically befor and after the beam cross over. The calculated deflection fields can be realized by declinated surfaces of the blanker electrodes.

  • Optic 91, No.1 (1992) 46-48

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