Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

During the last decades, focused ion beams (FIB) became a very useful and versatile tool in microelectronics industry, as well as in the field of basic and applied research and derived an exceedingly importance within the nanotechnology. For special purposes like ion milling, ion beam writing for doping or patterning from the µm- to the nm-range without any lithographic steps using Gallium and also other ion species which are of increasing interest. An introduction in design and operation of mass separated FIB systems, equipped with alloy liquid metal ion sources and the development and characterization of suited ion sources is given.
Examples, like ion beam synthesis of CoSi2 nano-structures, sputtering investigations and applications, the formation of ripples under FIB irradiation or the fabrication of NEMS structures on SOI substrates should demonstrate the manifold utilization of the microbeam technology.
Finally an outlook to prospective work with FIB in FZD is presented.