Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

Plasma immersion ion implantation of nitrogen in Si: Formation of SiO2, Si3N4 and stressed layers under thermal and sputtering effects

Ueda, M.; Beloto, A. F.; Reuther, H.; Parascandola, S.

• Surface and Coatings Technology 136 (2001) 244-248

Permalink: https://www.hzdr.de/publications/Publ-5265