Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

Density gradient in SiO2 films on silicon as revealed by positron annihilation spectroscopy

Revesz, A. G.; Anwand, W.; Brauer, G.; Hughes, H. L.; Skorupa, W.

Keywords: kein

• Vortrag (Konferenzbeitrag)
  32nd Semiconductor Interface Specialists Conference, Washington/DC, USA, Nov 29 - Dec 01, 2001

Permalink: https://www.hzdr.de/publications/Publ-4811