Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

1 Publikation

Stress relaxation and phase stability of cubic boron nitride films during annealing and ion implantation

Fitz, C.; Fukarek, W.; Möller, W.

Abstract

The high intrinsic stresses in cBN films after deposition are reduced significantly employing thermal treatment and ion implantation. In-situ stress measurement and ex-situ polarized infrared reflection spectroscopy are utilized to study stress relaxation and the phase stability. Argon ion implantation into cBN films at room temperature and at 340°C reveals that the critical fluence for amorphization increases with increasing temperature. The fraction of cBN transformed into sp2 bonded BN by Ar ion implantation decreases with increasing substrate temperature for the same amount of stress release.

Keywords: cubic boron nitride; intrinsic stress; annealing; ion implantation; infrared spectroscopy

  • Thin Solid Films 408 (2002) 155

Permalink: https://www.hzdr.de/publications/Publ-3850


Jahre: 2023 2022 2021 2020 2019 2018 2017 2016 2015