Addendum: Ion beam irradiation of nanostructures: sputtering, dopant incorporation, and dynamic annealing

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Holland-Moritz, H.; Johannes, A.; Möller, W.; Ronning, C.

Abstract

A previously published formalism to derive nanosphere sputtering yields is corrected and refined.

Keywords: Ion Irradiation; Nanostructures; Sputtering

Semiconductor Science and Technology 32(2017), 109401
DOI: 10.1088/1361-6641/aa88dc

Permalink: https://www.hzdr.de/publications/Publ-26660

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