Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

Range and damage distribution in ultra low energy boron ion implantation

Hatzopoulos, N.; Suder, S.; van den Berg, J. A.; Donelly, S. E.; Armour, D. G.; Panknin, D.; Fukarek, W.; Frey, L.; Foad, M. A.; Moffat, S.; Bailey, P.; Naakes, C. T. Q.

• Beitrag zu fremdem Sammelwerk
  Proc. 11th Int. Conf. Ion Implantation Technology; The Institute of Electrical and Electronics Engineers, Piscataway, USA, 1997, p. 527

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