Equipment Nanocomposite Materials
ClusterTool - Multifunctional UHV System -
The ClusterTool offers excellent conditions to realize experiments and investigations for different materials systems. A major advantage of the setup is the ability to perform interdisciplinary multi-step experiments. In situ RBS, Raman, ERDA and Ellipsometry measurements allow detailed investigations of the materials structure and properties during annealing (up to 1000°C) without breaking the vacuum. Multi-step experiments involving thin film growth, annealing in vacuum or gas/plasma environments, surface and structure modification and ion beam analysis, provided by the 6 MV beamline of the Ion Beam Center at HZDR, can be performed at the ClusterTool.
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contact:
Dr. M. Krause, matthias.krause@hzdr.de(1), 0351 / 260 - 3578
Raman spectroscopy chamber
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in situ Raman
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laser wavelength 473 nm; 523 nm
- sample heating up to 800°C
System Components | Details |
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distrubution chamber |
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environmental chamber |
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sputtering chamber |
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UHV tribometer |
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ion beam analysis chamber |
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storage chamber |
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Ion Beam Sputtering / Ion Beam Assisted Deposition (IBS/IBAD) - Dual ion beam deposition
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3 cm Kaufman ion source, ion energy 100-1200 eV
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Plasma bridge neutralization of the sputtering beam
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3 cm assistant Kaufman source, ion energy 25-1200 eV
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6” target (selection of materials Ti,Ag,Ni,Co,Cr,Ge,Fe,Ta,Mo,Zr,Nb,Mn,C,SiO3,Si)
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Growth rates 1-10 nm/min measurable by rate monitor
- sample heating up to 600°C
DC Magnetron sputtering setup
- reactive/non-reactive sputtering
- 3" heatable substrate holder
- substrate XYZ-manipulator and heating option up to 600°C
- process gas: Ar, Reactive gases: O2, N2, H2
- plasma emmisson monitoring
- 2" and 3" targets (selection of materials B,BN,Si,C,In,InSn,Sn,SnZn,Zn,Cu,Al,Cr,Ag,Mo,Al,V,Nb,Ti)
Nanoindenter UNAT from Asmec with Scratch Modul
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mesurement range:1 mN-1500 mN
Angle of contact measuring device Krüss DSA 10
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determine surface energy
Solid Spec 3700DUV (Shimadzu)
- Spectral photometer:
- Direct detection unit, spectral range: 190-3300 nm (N2 purging: 165-3300 nm)
- Integrating sphere (Spectralon): 200-2600 nm
- Detectors: photomultiplier (165-1000 nm), PbS (700-1800 nm), InGaAs (1600-3300 nm)
- Sample size (max): 4 cm x 50 cm x 70 cm
- Application
- Precise measurements of transmittance and reflectance spectra
- Reflectance from the strongly scattering surfaces
Ellipsometer (Woollam M-2000)
- Ellipsometer
- Fixed-angle illumination-detection geometry
- rotating compensator
- Wavelength range 211 nm to 1688 nm
- evaluation software WVASE
Inhalt aus Sidebar
URL dieses Artikels
https://www.hzdr.de/db/Cms?pOid=50184
Links im Text
(1) | mailto:matthias.krause@hzdr.de |
(2) | https://www.hzdr.de/db/Cms?pOid=50184#top |
(3) | https://www.hzdr.de/db/!ContMan.Angebote.Liste?pNid=2761&pSelAnzeige=1&pSelInstitut=12601 |